About: Extreme ultraviolet lithography

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A next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm.

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  • ein Fotolithografie-Verfahren, das extrem ultraviolette Strahlung nutzt (de)
  • una tecnología de litografía de próxima generación que utiliza una longitud de onda ultravioleta extrema (LUVE), que actualmente se espera que sea de 13,5 nm. (es)
  • litografia oparta o promieniowanie UV 13.5 nm (pl)
  • procédé de photolithographie assez semblable aux procédés de lithographie classiques actuels2 . Il utilise un rayonnement ultraviolet (UV) d'une longueur d'onde de l'ordre de 10 à 15 nanomètres (rayons X-mous) (fr)
  • a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. (en)
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  • Extreme ultraviolet lithography (en)
  • Fotolitografia ultraviolada extrema (electrònica) (ca)
  • EUV-Lithografie (de)
  • الأشعة فوق البنفسجية المتطرفة (ar)
  • Litografía ultravioleta extrema (es)
  • Lithographie extrême ultraviolet (fr)
  • Litografia ultravioletta estrema (it)
  • 極端紫外線リソグラフィ (ja)
  • Фотолитография в глубоком ультрафиолете (ru)
  • 极紫外光刻 (zh)
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