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Химическое осаждение из газовой фазы Deposició química de vapor Dépôt chimique en phase vapeur Pengendapan uap kimia Chemiczne osadzanie z fazy gazowej Chemical vapor deposition Хімічне осадження з парової фази 화학기상증착 Deposición química de vapor Chemical vapor deposition Deposizione chimica da vapore Chemická depozice z plynné fáze Chemische Gasphasenabscheidung Deposição química em fase vapor ترسيب كيميائي للبخار 化学气相沉积 化学気相成長
rdfs:comment
화학기상증착(CVD, chemical vapor deposition)은 반도체 제조 공정중의 한 단계로 화학 물질을 플라즈마 및 열을 이용하여 박막을 형성, 메탈라인 isolation 혹은 그외 다른 목적의 isolation을 목적으로 하는 공정을 말한다. 가스의 화학반응을 이용하여 절연 물질이나 반도체, 금속 등을 침적하는 방법으로, 웨이퍼의 표면에 필요한 물질을 응착시킬 때 이용된다. 이 문서에는 다음커뮤니케이션(현 카카오)에서 GFDL 또는 CC-SA 라이선스로 배포한 글로벌 세계대백과사전의 "화학 증기 침적법" 항목을 기초로 작성된 글이 포함되어 있습니다. Le dépôt chimique en phase vapeur (ou CVD pour l'anglais chemical vapor deposition) est une méthode de dépôt sous vide de films minces, à partir de précurseurs gazeux. Хімі́чне оса́дження з парово́ї фа́зи, ХОПФ (англ. Chemical vapor deposition, CVD) — хімічний процес, метод нанесення покриття, що використовується для отримання високоякісних чистих твердих матеріалів з високими характеристиками. ХОПФ часто використовують в напівпровідниковій промисловості для виготовлення тонких плівок. Також використовується для виготовлення синтетичних діамантів, а також інших матеріалів, таких як кремній, карбід кремнію, , вольфрам, SiO₂, нітрид титану, різні діелектрики. La Deposición Química de Vapor o CVD (de sus siglas en inglés Chemical Vapor Deposition) es un proceso químico utilizado para producir productos de alta pureza y de alto rendimiento de materiales sólidos. El proceso se utiliza a menudo en la industria de semiconductores para producir películas delgadas. En un proceso CVD estándar el sustrato (oblea) se expone a uno o más precursores volátiles, que reaccionan o se descomponen en la superficie del sustrato para producir el depósito deseado. Con frecuencia, también se producen subproductos volátiles, que son eliminados por medio de un flujo de gas que pasa a través de la cámara de reacción. La deposició química de vapor o DQV és un procés químic per a dipositar capes primes de diversos materials sobre un substrat. En un procés típic de DQV el substrat és exposat a un o més precursors volàtils, activats mitjançant impactes electromagnètics bé de temperatura, plasmatics, fotònics, o d'altres, per tal de fer-los reaccionar, descomponent-se en la superfície del substrat per a produir el dipòsit desitjat. Com a residus, es produeixen sovint subproductes volàtils, que són remoguts per mitjà d'un flux de gas que passa a través de la cambra de reacció. La deposizione chimica da vapore (in inglese Chemical Vapor Deposition o CVD) è una tecnica di sintesi che permette di ottenere su supporto solido un deposito a partire da un precursore molecolare, introdotto in forma gassosa e che si decompone sulla superficie del substrato. Il trasporto del precursore avviene mediante l'uso di un gas di trasporto come ossigeno, argon, idrogeno o azoto, grazie al quale vengono poi allontanati dal sistema anche i prodotti di decomposizione gassosi. 化學氣相沉積(英語:chemical vapor deposition,簡稱CVD)是一種用來產生純度高、性能好的固態材料的化學技術。半導體產業使用此技術來成長薄膜。典型的CVD製程是將晶圓(基底)暴露在一種或多種不同的前趨物下,在基底表面發生化學反應或/及化學分解來產生欲沉積的薄膜。反應過程中通常也會伴隨地產生不同的副產品,但大多會隨著氣流被帶走,而不會留在反應腔(reaction chamber)中。 大都使用CVD技术来沉积不同形式的材料,包括单晶、多晶、及磊晶材料。这些材料有硅、碳纤维、、奈米线、奈米碳管、SiO2、硅锗、钨、硅碳、氮化硅、及各种不同的等材料。CVD制程也常用来生成合成钻石。 Deposição química em fase vapor ou CVD (chemical vapour deposition) é um processo versátil para construção de filmes sólidos, revestimentos, fibras, componentes monolíticos, entre outros materiais. Com a técnica de CVD é possível fazer deposição de metais, elementos não metálicos e ainda grande quantidade compostos como carbonetos, nitretos, óxidos, compostos intermetálicos e muitos outros. Essa tecnologia é fator essencial, por exemplo, para a indústria de semicondutores e outros componentes eletrônicos, em componentes óticos e optoeletrônicos, fotossensíveis e revestimentos. Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapour deposition, CVD), selten auch chemische Dampfphasenabscheidung, versteht man eine Gruppe von Beschichtungsverfahren bzw. Dünnschichttechnologien, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen und Lichtwellenleitern eingesetzt werden. Chemical vapor deposition, afkorting CVD (letterlijk vertaald “chemische dampdepositie”) is een chemisch opdampproces waarbij een thin film (dunne laag materiaal) op een substraat (ondergrond) wordt aangebracht. Хими́ческое осажде́ние из га́зовой фа́зы (ХОГФ) (химическое парофазное осаждение, англ. Chemical vapor deposition, CVD) — процесс, используемый для получения высокочистых твёрдых материалов. Процесс часто используется в индустрии полупроводников для создания тонких плёнок. Как правило, при процессе CVD подложка помещается в пары одного или нескольких веществ, которые, вступая во взаимные реакции и/или разлагаясь, формируют на поверхности подложки слой необходимого вещества. Побочно часто образуется также газообразные продукты реакции, выносимые из камеры осаждения потоком газа-носителя. Chemiczne osadzanie z fazy gazowej (używany jest skrótowiec CVD, od ang. chemical vapour deposition) – metoda obróbki cieplno-chemicznej materiałów. Służy do nanoszenia cienkich powłok na obrabiany materiał w celu polepszenia albo zmiany właściwości fizycznych, chemicznych lub mechanicznych powierzchni obrabianego materiału. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. Chemická depozice z plynné fáze (CVD - Chemical Vapor Deposition) je chemický proces využívanýpro přípravu (např. polovodičový průmysl). Substrát je vystavenúčinkům jednoho nebo více těkavých prekurzorů, které na jeho povrchu reagují mezisebou nebo se rozkládají za vzniku požadovaného materiálu, celý proces probíhá za vysoké teploty. Při tomto procesu se často uvolňují těkavé vedlejší produkty, které jsou z reakčního prostoru odstraňovány proudem plynu nebo vakuem. Pengendapan uap kimia (bahasa Inggris: chemical vapor deposition, CVD) adalah proses kimia untuk memberi lapisan tipis pada permukaan wafer yang digunakan dalam pembuatan microsystem. Dalam proses ini, komponen gas bereaksi di permukaan wafer dan membentuk lapisan tipis. Energi yang digunakan untuk pemecahan dan eksitasi molekul antara lain: * Panas: Thermal CVD * Plasma: Plasma Enhanced CVD (PECVD) * Radiasi: Radiation Enhanced CVD * l * * s الترسيب الكيميائي للبخار (يرمز له CVD من Chemical vapor deposition) هي عملية كيميائية تستخدم لإنتاج مواد صلبة عالية الأداء وعالية النقاوة. وغالباً ما يكون لهذه العملية تطبيقات في مجال أشباه الموصلات ولإنتاج الطبقات الرقيقة ولتحضير الأنابيب النانوية الكربونية. تجري في عملية الترسيب الكيميائي للبخار تعريض الرقاقة (الركازة) إلى مركب أو عدة مركبات طليعية متطايرة والتي تتفاعل و/أو تتفكك على سطح الركازة لتعطي المادة المرغوبة. يصاحب العملية نشوء منتجات ثانوية، والتي تزال من حجرة التفاعل بواسطة تدفق تيار غازي. 化学気相成長(かがくきそうせいちょう)、化学気相蒸着(かがくきそうじょうちゃく)または化学蒸着(CVD: chemical vapor deposition)は、さまざまな物質の薄膜を形成する蒸着法のひとつで、石英などで出来た反応管内で加熱した基板物質上に、目的とする薄膜の成分を含む原料ガスを供給し、基板表面あるいは気相での化学反応により膜を堆積する方法である。常圧(大気圧)や加圧した状態での運転が可能な他、化学反応を活性化させる目的で、反応管内を減圧しプラズマなどを発生させる場合もある。切削工具の表面処理や半導体素子の製造工程において一般的に使用される。
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Le dépôt chimique en phase vapeur (ou CVD pour l'anglais chemical vapor deposition) est une méthode de dépôt sous vide de films minces, à partir de précurseurs gazeux. La deposizione chimica da vapore (in inglese Chemical Vapor Deposition o CVD) è una tecnica di sintesi che permette di ottenere su supporto solido un deposito a partire da un precursore molecolare, introdotto in forma gassosa e che si decompone sulla superficie del substrato. Il trasporto del precursore avviene mediante l'uso di un gas di trasporto come ossigeno, argon, idrogeno o azoto, grazie al quale vengono poi allontanati dal sistema anche i prodotti di decomposizione gassosi. Deposição química em fase vapor ou CVD (chemical vapour deposition) é um processo versátil para construção de filmes sólidos, revestimentos, fibras, componentes monolíticos, entre outros materiais. Com a técnica de CVD é possível fazer deposição de metais, elementos não metálicos e ainda grande quantidade compostos como carbonetos, nitretos, óxidos, compostos intermetálicos e muitos outros. Essa tecnologia é fator essencial, por exemplo, para a indústria de semicondutores e outros componentes eletrônicos, em componentes óticos e optoeletrônicos, fotossensíveis e revestimentos. Produtos provenientes dessa tecnologia têm um mercado em grande expansão no mundo moderno. A Tecnologia de CVD pode ser aplicada em todos os campos da nanociência e nanotecnologia. Fazendo uso dessa tecnologia inovadora a indústria de transformação gera produtos com elevado valor agregados, além disso, o desenvolvimento dessa técnica tem permitido a indústria a avançar rumo a tecnologias mais avançadas, com produtos mais eficientes em desempenho e qualidade. Citando alguns exemplos de produtos comerciais que usam de CVD na sua fabricação, notório a aplicação em áreas muito avançadas como: - Difusão de camadas em semicondutores avançados em circuitos integrados de nitretos de titânio; - Revestimento de carbono tipo diamante em componentes da indústria têxtil aumentando a resistência dos tecidos; - Metalização de semicondutores com deposição de cobre minimizando o efeito de eletromigração. CVD é o processo mais usado para produção de componentes semicondutores; - Revestimentos de dispositivos ópticos de economia de energia de vidro estruturado, produzido in situ durante o processo de produção; - Fibras de boro que são extremamente rígidas e resistentes e são usadas no reforço de estruturas em projetos aeroespaciais; - Filmes de diamantes de alta condutividade térmica depositado em distribuidores de calor para dissipar o calor em circuitos integrados de alta densidade. CVD pode ser definido como formação de um filme fino sólido pela deposição atômica ou molecular, em uma superfície aquecida, sendo o sólido oriundo de uma reação química onde os precursores estão na fase de vapor. O processo de CVD é atomístico por natureza, onde as espécies depositadas são átomos ou moléculas ou a combinação desses. O processo de CVD se distingue do processo de PVD (physical vapour deposition) em vários aspectos, a começar pela essência dos processos. Enquanto na CVD ocorre uma reação química no decorrer da deposição, no processo de PVD observa-se mecanismo de adsorção dos átomos e moléculas na superfície. Na PVD, assim como na CVD, as espécies precursoras da reação encontram-se na fase de vapor Apesar de similares os processos de CVD e PVD não competem entre si. Ao contrário disso, nas plataformas mais modernas de produção de filmes ultrafinos, os processos são empregados de forma integrada potencializando as vantagens que cada técnica tem intrinsecamente e conseqüentemente minimizando os fatores desfavoráveis. A técnica de CVD faz uso de plasma, um fenômeno físico, e a técnica de PVD reativa ocorre em ambiente químico. Como resultado, as novas plataformas apresentam melhores resultados tanto em produção como em qualidade de produto. O processo de CVD, no entanto, tem importantes vantagens que faz dele o processo preferido em muitos casos. A técnica de CVD pode ser empregada para revestimento de superfícies em três dimensões com qualidade e boa taxa de deposição, enquanto PVD funciona muito bem para processos lineares. Os equipamentos utilizados para CVD não requerem ultra-vácuo e são bastante versáteis, possibilitando a mudança de composição durante a deposição e a co-deposição de elementos ou compostos. No entanto tem algumas desvantagens, e a maior delas são as altas temperaturas necessárias para promover o processo de maneira eficiente, que em muitos casos destroem a superfície de deposição, pois os substratos são termicamente instáveis, e o uso de precursores com alta pressão de vapor, que são freqüentemente perigosos e algumas vezes altamente tóxicos. Para minimizar o impacto dos processos em alta temperatura foram desenvolvidas novas tecnologias de vaporização de precursores e novos tipos de precursores baseados na integração entre CVD e PVD resultando, por exemplo, no desenvolvimento dos processos de Plasma-CVD e de Oganometálico-CVD. Pengendapan uap kimia (bahasa Inggris: chemical vapor deposition, CVD) adalah proses kimia untuk memberi lapisan tipis pada permukaan wafer yang digunakan dalam pembuatan microsystem. Dalam proses ini, komponen gas bereaksi di permukaan wafer dan membentuk lapisan tipis. Energi yang digunakan untuk pemecahan dan eksitasi molekul antara lain: * Panas: Thermal CVD * Plasma: Plasma Enhanced CVD (PECVD) * Radiasi: Radiation Enhanced CVD * l * * s La Deposición Química de Vapor o CVD (de sus siglas en inglés Chemical Vapor Deposition) es un proceso químico utilizado para producir productos de alta pureza y de alto rendimiento de materiales sólidos. El proceso se utiliza a menudo en la industria de semiconductores para producir películas delgadas. En un proceso CVD estándar el sustrato (oblea) se expone a uno o más precursores volátiles, que reaccionan o se descomponen en la superficie del sustrato para producir el depósito deseado. Con frecuencia, también se producen subproductos volátiles, que son eliminados por medio de un flujo de gas que pasa a través de la cámara de reacción. Los procesos de microfabricación CVD se emplean ampliamente para depositar materiales en diversas formas, incluyendo: monocristalino, policristalino, amorfo, y epitaxial. Estos materiales incluyen: silicio, fibra de carbono, , filamentos, , SiO2, , tungsteno, carburo de silicio, nitruro de silicio, , nitruro de titanio, y diversos dieléctricos de alta permitividad eléctrica. El proceso de CVD se utiliza también para producir diamantes sintéticos. 化學氣相沉積(英語:chemical vapor deposition,簡稱CVD)是一種用來產生純度高、性能好的固態材料的化學技術。半導體產業使用此技術來成長薄膜。典型的CVD製程是將晶圓(基底)暴露在一種或多種不同的前趨物下,在基底表面發生化學反應或/及化學分解來產生欲沉積的薄膜。反應過程中通常也會伴隨地產生不同的副產品,但大多會隨著氣流被帶走,而不會留在反應腔(reaction chamber)中。 大都使用CVD技术来沉积不同形式的材料,包括单晶、多晶、及磊晶材料。这些材料有硅、碳纤维、、奈米线、奈米碳管、SiO2、硅锗、钨、硅碳、氮化硅、及各种不同的等材料。CVD制程也常用来生成合成钻石。 Chemical vapor deposition, afkorting CVD (letterlijk vertaald “chemische dampdepositie”) is een chemisch opdampproces waarbij een thin film (dunne laag materiaal) op een substraat (ondergrond) wordt aangebracht. Chemiczne osadzanie z fazy gazowej (używany jest skrótowiec CVD, od ang. chemical vapour deposition) – metoda obróbki cieplno-chemicznej materiałów. Służy do nanoszenia cienkich powłok na obrabiany materiał w celu polepszenia albo zmiany właściwości fizycznych, chemicznych lub mechanicznych powierzchni obrabianego materiału. الترسيب الكيميائي للبخار (يرمز له CVD من Chemical vapor deposition) هي عملية كيميائية تستخدم لإنتاج مواد صلبة عالية الأداء وعالية النقاوة. وغالباً ما يكون لهذه العملية تطبيقات في مجال أشباه الموصلات ولإنتاج الطبقات الرقيقة ولتحضير الأنابيب النانوية الكربونية. تجري في عملية الترسيب الكيميائي للبخار تعريض الرقاقة (الركازة) إلى مركب أو عدة مركبات طليعية متطايرة والتي تتفاعل و/أو تتفكك على سطح الركازة لتعطي المادة المرغوبة. يصاحب العملية نشوء منتجات ثانوية، والتي تزال من حجرة التفاعل بواسطة تدفق تيار غازي. يعتمد مبدأ الترسيب الكيميائي للبخار على تشكل طبقة صلبة من الطور الغازي نتيجة تفاعل كيميائي على سطح الركازة الساخن . من الشروط الواجب توافرها أن تكون المواد المكونة للطبقة لمراد وضعها ذات تطايرية عالية. Chemická depozice z plynné fáze (CVD - Chemical Vapor Deposition) je chemický proces využívanýpro přípravu (např. polovodičový průmysl). Substrát je vystavenúčinkům jednoho nebo více těkavých prekurzorů, které na jeho povrchu reagují mezisebou nebo se rozkládají za vzniku požadovaného materiálu, celý proces probíhá za vysoké teploty. Při tomto procesu se často uvolňují těkavé vedlejší produkty, které jsou z reakčního prostoru odstraňovány proudem plynu nebo vakuem. Tato metoda je široce využívána v polovodičovém průmyslu. Slouží k přípravě polykrystalického, amorfního a epitaxního oxidu křemičitého,uhlíkových vláken a nanotrubic, nitridu křemičitého, atd. Pomocí CVD se také připravují syntetické diamanty. Хімі́чне оса́дження з парово́ї фа́зи, ХОПФ (англ. Chemical vapor deposition, CVD) — хімічний процес, метод нанесення покриття, що використовується для отримання високоякісних чистих твердих матеріалів з високими характеристиками. Процес полягає в нанесенні зовнішнього покриття або покриття з модифікацією поверхні, що покривається, коли метал, сплав, композиційний матеріал, діелектрик або кераміка осаджується на розігріту підкладку (основу). Газоподібні реагенти розпадаються або сполучаються поблизу підкладки або на самій підкладці. В результаті цього на підкладці осаджується необхідний матеріал у формі хімічного елемента, сплаву або сполуки. Енергія для зазначених хімічних реакцій може бути забезпечена нагріванням підкладки плазмовим розрядом або променем лазера. ХОПФ часто використовують в напівпровідниковій промисловості для виготовлення тонких плівок. Також використовується для виготовлення синтетичних діамантів, а також інших матеріалів, таких як кремній, карбід кремнію, , вольфрам, SiO₂, нітрид титану, різні діелектрики. Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. Microfabrication processes widely use CVD to deposit materials in various forms, including: monocrystalline, polycrystalline, amorphous, and epitaxial. These materials include: silicon (dioxide, carbide, nitride, oxynitride), carbon (fiber, nanofibers, nanotubes, diamond and graphene), fluorocarbons, filaments, tungsten, titanium nitride and various high-κ dielectrics. The term chemical vapour deposition was coined 1960 by John M. Blocher, Jr. who intended to differentiate chemical from physical vapour deposition (PVD). 화학기상증착(CVD, chemical vapor deposition)은 반도체 제조 공정중의 한 단계로 화학 물질을 플라즈마 및 열을 이용하여 박막을 형성, 메탈라인 isolation 혹은 그외 다른 목적의 isolation을 목적으로 하는 공정을 말한다. 가스의 화학반응을 이용하여 절연 물질이나 반도체, 금속 등을 침적하는 방법으로, 웨이퍼의 표면에 필요한 물질을 응착시킬 때 이용된다. 이 문서에는 다음커뮤니케이션(현 카카오)에서 GFDL 또는 CC-SA 라이선스로 배포한 글로벌 세계대백과사전의 "화학 증기 침적법" 항목을 기초로 작성된 글이 포함되어 있습니다. Unter dem Begriff chemische Gasphasenabscheidung (englisch chemical vapour deposition, CVD), selten auch chemische Dampfphasenabscheidung, versteht man eine Gruppe von Beschichtungsverfahren bzw. Dünnschichttechnologien, welche unter anderem bei der Herstellung von mikroelektronischen Bauelementen und Lichtwellenleitern eingesetzt werden. Хими́ческое осажде́ние из га́зовой фа́зы (ХОГФ) (химическое парофазное осаждение, англ. Chemical vapor deposition, CVD) — процесс, используемый для получения высокочистых твёрдых материалов. Процесс часто используется в индустрии полупроводников для создания тонких плёнок. Как правило, при процессе CVD подложка помещается в пары одного или нескольких веществ, которые, вступая во взаимные реакции и/или разлагаясь, формируют на поверхности подложки слой необходимого вещества. Побочно часто образуется также газообразные продукты реакции, выносимые из камеры осаждения потоком газа-носителя. С помощью CVD-процесса производят материалы различных структур: монокристаллы, поликристаллы, аморфные тела и эпитаксиальные. Примеры материалов: кремний, углеродное волокно, углеродное нановолокно, углеродные нанотрубки, графен, SiO2, вольфрам, карбид кремния, нитрид кремния, нитрид титана, различные диэлектрики, а также синтетические алмазы. La deposició química de vapor o DQV és un procés químic per a dipositar capes primes de diversos materials sobre un substrat. En un procés típic de DQV el substrat és exposat a un o més precursors volàtils, activats mitjançant impactes electromagnètics bé de temperatura, plasmatics, fotònics, o d'altres, per tal de fer-los reaccionar, descomponent-se en la superfície del substrat per a produir el dipòsit desitjat. Com a residus, es produeixen sovint subproductes volàtils, que són remoguts per mitjà d'un flux de gas que passa a través de la cambra de reacció. 化学気相成長(かがくきそうせいちょう)、化学気相蒸着(かがくきそうじょうちゃく)または化学蒸着(CVD: chemical vapor deposition)は、さまざまな物質の薄膜を形成する蒸着法のひとつで、石英などで出来た反応管内で加熱した基板物質上に、目的とする薄膜の成分を含む原料ガスを供給し、基板表面あるいは気相での化学反応により膜を堆積する方法である。常圧(大気圧)や加圧した状態での運転が可能な他、化学反応を活性化させる目的で、反応管内を減圧しプラズマなどを発生させる場合もある。切削工具の表面処理や半導体素子の製造工程において一般的に使用される。
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