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In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists.

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  • In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists. (en)
  • レジストとは、主に工業用途で使用される、物理的、化学的処理に対する保護膜、及びその形成に使用される物質である。 諸般の製造過程で、サンドブラスト、イオン注入、エッチングなどの処理を施す際、被処理物表面の一部を樹脂などで保護し、処理をしたあとに保護膜を剥離することで、被処理物の所望の部分のみを処理することができる。この手法に使われる保護膜をレジストという。処理に耐える (resist) 事からこの名がついた。用途や塗り分け(パターニング)方法で幾種類かに分類される。 (ja)
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  • September 2018 (en)
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  • yes (en)
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  • In semiconductor fabrication, a resist is a thin layer used to transfer a circuit pattern to the semiconductor substrate which it is deposited upon. A resist can be patterned via lithography to form a (sub)micrometer-scale, temporary mask that protects selected areas of the underlying substrate during subsequent processing steps. The material used to prepare said thin layer is typically a viscous solution. Resists are generally proprietary mixtures of a polymer or its precursor and other small molecules (e.g. photoacid generators) that have been specially formulated for a given lithography technology. Resists used during photolithography are called photoresists. (en)
  • レジストとは、主に工業用途で使用される、物理的、化学的処理に対する保護膜、及びその形成に使用される物質である。 諸般の製造過程で、サンドブラスト、イオン注入、エッチングなどの処理を施す際、被処理物表面の一部を樹脂などで保護し、処理をしたあとに保護膜を剥離することで、被処理物の所望の部分のみを処理することができる。この手法に使われる保護膜をレジストという。処理に耐える (resist) 事からこの名がついた。用途や塗り分け(パターニング)方法で幾種類かに分類される。 (ja)
rdfs:label
  • レジスト (ja)
  • Resist (semiconductor fabrication) (en)
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