About: Capacitively coupled plasma

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A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric.

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  • A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. (en)
  • 容量結合プラズマ（ようりょうけつごうプラズマ、Capacitively Coupled Plasma、略称：CCP）は、産業プラズマの中で最も一般的な種類の1つである。基本的には、装置内で短距離に隔てられた2枚の金属極板によって構成されている。装置内の気圧は大気圧より低いか、大気圧と同程度の場合がある。 (ja)
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  • A capacitively coupled plasma (CCP) is one of the most common types of industrial plasma sources. It essentially consists of two metal electrodes separated by a small distance, placed in a reactor. The gas pressure in the reactor can be lower than atmosphere or it can be atmospheric. (en)
  • 容量結合プラズマ（ようりょうけつごうプラズマ、Capacitively Coupled Plasma、略称：CCP）は、産業プラズマの中で最も一般的な種類の1つである。基本的には、装置内で短距離に隔てられた2枚の金属極板によって構成されている。装置内の気圧は大気圧より低いか、大気圧と同程度の場合がある。 (ja)
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  • Capacitively coupled plasma (en)
  • 容量結合プラズマ (ja)
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