Molecular vapor deposition is the gas-phase reaction between surface reactive chemicals and an appropriately receptive surface. Often bi-functional silanes are used in which one termination of the molecule is reactive. For example, a functional chlorosilane (R-Si-Cl3) can react with surface hydroxyl groups (-OH) resulting a radicalized (R) deposition on the surface. The advantage of a gas phase reaction over a comparable liquid phase process is the control of moisture from the ambient environment, which often results in cross polymerization of the silane leading to particulates on the treated surface. Often a heated sub-atmospheric vacuum chamber is used to allow precise control of the reactants and water content. Additionally the gas phase process allows for easy treatment of complex par
Property | Value |
---|---|
dbo:abstract |
|
dbo:wikiPageID |
|
dbo:wikiPageLength |
|
dbo:wikiPageRevisionID |
|
dbo:wikiPageWikiLink | |
dbp:wikiPageUsesTemplate | |
dct:subject | |
gold:hypernym | |
rdf:type | |
rdfs:comment |
|
rdfs:label |
|
rdfs:seeAlso | |
owl:sameAs | |
prov:wasDerivedFrom | |
foaf:isPrimaryTopicOf | |
is dbo:wikiPageDisambiguates of | |
is dbo:wikiPageWikiLink of | |
is foaf:primaryTopic of |