A field emitter array (FEA) is a particular form of large-area field electron source. FEAs are prepared on a silicon substrate by lithographic techniques similar to those used in the fabrication of integrated circuits. Their structure consists of a very large number of individual, similar, small field electron emitters, usually organized in a regular two-dimensional pattern. FEAs need to be distinguished from "film" or "mat" type large-area sources, where a thin film-like layer of material is deposited onto a substrate, using a uniform deposition process, in the hope or expectation that (as a result of statistical irregularities in the process) this film will contain a sufficiently large number of individual emission sites.
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