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- Chemical Vapor Deposition was a monthly peer-reviewed scientific journal covering materials science. It was established in 1995 and ceased independent publication in 2015, when it became a section of Advanced Materials Interfaces. The journal was published by Wiley-VCH and the editor-in-chief was Peter Gregory. (en)
- Chemical Vapor Deposition (abrégé en Chem. Vap. Deposition ou CVD) est une revue scientifique à comité de lecture qui publie des articles concernant tous les aspects du dépôt chimique en phase vapeur. D'après le Journal Citation Reports, le facteur d'impact de ce journal était de 1,829 en 2009. L'actuel directeur de publication est Michael L. Hitchman. (fr)
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- 3457 (xsd:nonNegativeInteger)
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- Chemical Vapor Deposition cover.jpg (en)
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- Chemical Vapor Deposition (en)
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- Chemical Vapor Deposition was a monthly peer-reviewed scientific journal covering materials science. It was established in 1995 and ceased independent publication in 2015, when it became a section of Advanced Materials Interfaces. The journal was published by Wiley-VCH and the editor-in-chief was Peter Gregory. (en)
- Chemical Vapor Deposition (abrégé en Chem. Vap. Deposition ou CVD) est une revue scientifique à comité de lecture qui publie des articles concernant tous les aspects du dépôt chimique en phase vapeur. D'après le Journal Citation Reports, le facteur d'impact de ce journal était de 1,829 en 2009. L'actuel directeur de publication est Michael L. Hitchman. (fr)
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- Chemical Vapor Deposition (journal) (en)
- Chemical Vapor Deposition (journal) (fr)
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- Chemical Vapor Deposition (en)
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