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Vapour phase decomposition (VPD) is a method used in the semiconductor industry to improve the sensitivity of total-reflection x-ray fluorescence spectroscopy by changing the contaminant from a thin layer (which has an angle-dependent fluorescence intensity in the -domain) to a granular residue. When using granular residue the limits of detection are improved because of a more intense fluorescence signal in angles smaller than the .

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  • Gasphasenzersetzung (de)
  • Vapour phase decomposition (en)
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  • Die Gasphasenzersetzung (englisch vapour phase decomposition, VPD) ist eine Probenpräparationsmethode der Analytischen Chemie zur Konzentrierung von vorrangig metallischen Verunreinigungen auf (Silizium-)Proben. Sie wird unter anderem in der Halbleiterindustrie verwendet, um die Empfindlichkeit der Totalreflexions-Röntgenfluoreszenzanalyse (TXRF) oder anderer analytischer Verfahren zu verbessern.Entwickelt wurde das Verfahren 1984 von Mitarbeitern der Firma Toshiba. (de)
  • Vapour phase decomposition (VPD) is a method used in the semiconductor industry to improve the sensitivity of total-reflection x-ray fluorescence spectroscopy by changing the contaminant from a thin layer (which has an angle-dependent fluorescence intensity in the -domain) to a granular residue. When using granular residue the limits of detection are improved because of a more intense fluorescence signal in angles smaller than the . (en)
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  • Die Gasphasenzersetzung (englisch vapour phase decomposition, VPD) ist eine Probenpräparationsmethode der Analytischen Chemie zur Konzentrierung von vorrangig metallischen Verunreinigungen auf (Silizium-)Proben. Sie wird unter anderem in der Halbleiterindustrie verwendet, um die Empfindlichkeit der Totalreflexions-Röntgenfluoreszenzanalyse (TXRF) oder anderer analytischer Verfahren zu verbessern.Entwickelt wurde das Verfahren 1984 von Mitarbeitern der Firma Toshiba. (de)
  • Vapour phase decomposition (VPD) is a method used in the semiconductor industry to improve the sensitivity of total-reflection x-ray fluorescence spectroscopy by changing the contaminant from a thin layer (which has an angle-dependent fluorescence intensity in the -domain) to a granular residue. When using granular residue the limits of detection are improved because of a more intense fluorescence signal in angles smaller than the . (en)
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